The Logitech LogiPol CS60 Polishing Solution, 22.7 L, 5 Gallon (0CON-510) is a ready-to-use colloidal silica slurry with a mean particle diameter of 60 nm. Developed for semiconductor and optoelectronic polishing, it supports bulk material removal and thin-film planarisation across a range of hard and delicate materials. The solution is designed for use with Logitech polishing pads.
Key Features
- Fine 60 nm colloidal silica particles, supporting controlled polishing and high-quality surface preparation
- High amorphous silica concentration, with a verified content of 50-60%
- Mildly alkaline formulation, with a pH range of 8.5-9.0
- Consistent physical properties, with a density of 1.39 at 20 °C and a boiling point of 100 °C
- Ready to use directly from the bottle, without requiring dilution or preparation before initial use
- Suitable for daily slurry circulation, requiring only mild agitation after opening to minimise solids settling
- Broad material suitability, including ceramic, silicon, sapphire, lithium niobate, YAG crystals, PZT and fibre optic rods
- Supports III-V semiconductor processing, including indium phosphide and gallium arsenide materials
- Suitable for multiple polishing stages, including bulk polish removal and thin-film planarisation
- Large 22.7 L supply format, provided as a 5 gallon bottle for ongoing laboratory or production use
Note: Store the sealed container in its original packaging in a cool, dry area at ambient temperature. Do not store below 0 °C or above 37.8 °C. Mildly agitate the slurry each day after opening and consult the current Logitech Safety Data Sheet before use.
Benefits
- Supports consistent polishing results across semiconductor, optical and optoelectronic material preparation workflows.
- Reduces preparation time because the slurry can be used directly from the supplied bottle.
- Provides flexibility for both substantial material removal and controlled planarisation of thin films.
- Helps laboratories standardise polishing across a broad selection of hard, crystalline and semiconductor materials.
- Provides a larger-volume supply for facilities with regular polishing requirements, reducing the frequency of container replacement.
Why Choose the Logitech LogiPol CS60 Polishing Solution, 22.7 L, 5 Gallon (0CON-510)?
The Logitech LogiPol CS60 Polishing Solution, 22.7 L, 5 Gallon (0CON-510) combines a controlled 60 nm colloidal silica formulation with broad suitability for semiconductor, ceramic, optical and crystalline materials. Its ready-to-use format supports both bulk polishing and thin-film planarisation while simplifying slurry preparation. John Morris Group supplies Logitech polishing consumables for Australian research, laboratory and production applications.
