16" Diameter plain Expanded Polyurethane Polishing Pad - 0.050" thick W/PSA backing (Type 16EP2P) - each_1658507
Representative image only

Logitech EP2 Plain Polyurethane Polishing Pad, 16 in

$2,717.45

The price is inclusive of GST

The Logitech EP2 Plain Polyurethane Polishing Pad, 16 in (0CON-483) is a porous expanded polyurethane pad manufactured for chemical mechanical polishing of hard materials. This single 16 in (400 mm) EP2-P pad has a 1.3 mm thickness and pressure-sensitive adhesive backing for secure attachment to a suitable polishing plate.

Key Features

  • 16 in (400 mm) pad diameter, providing the specified dimensions for this EP2-P variant
  • Plain, non-grooved surface, designed for polishing surfaces smaller than 20 cm²
  • Micro-cellular EP2 construction, producing a sponge-like response while maintaining hardness and flatness
  • 1.3 mm pad thickness, equivalent to approximately 0.050 in
  • Pressure-sensitive adhesive backing, enabling stable attachment to a clean, smooth and flat polishing plate
  • Porous expanded polyurethane surface, selected to retain abrasive efficiently during CMP
  • Controlled pad density, specified at 0.60 g/cm³
  • Controlled compressibility, with a dynamic compressibility of 9.3%
  • High elastic recovery, with a stated elastic rebound of 93%
  • Balanced pad hardness, specified at Shore A 85 and Shore D 32
  • Suitable for hard materials, including sapphire, optical materials and ceramics
  • Single-pad supply format, providing one polishing pad per order

Note: This is the plain EP2-P configuration intended for polishing surfaces smaller than 20 cm².

Benefits

  • Maintains useful pad hardness and flatness while providing a compressible polishing surface.
  • Recovers after compression to support consistent contact throughout the polishing process.
  • Helps retain abrasive at the working surface for efficient CMP processing.
  • Supports fast polishing while maintaining effective control of sample flatness.
  • Provides the plain-pad configuration recommended for smaller polishing areas.

Why Choose the Logitech EP2 Plain Polyurethane Polishing Pad, 16 in (0CON-483)?

The Logitech EP2 Plain Polyurethane Polishing Pad, 16 in (0CON-483) combines a porous micro-cellular structure, controlled compressibility and pressure-sensitive adhesive backing for precision polishing of hard materials. John Morris Group supplies this exact Logitech CMP consumable for semiconductor, optical and advanced-material processing applications across Australia.

Over 40,000 Customers Trust John Morris