14" Diameter plain Expanded Polyurethane Polishing Pad - 0.050" thick W/PSA backing (Type 14EP1P) - Pack of 5_1658587
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Logitech EP1 Plain Polishing Pad, 14 in, Pack of 5

The Logitech EP1 Plain Polishing Pad, 14 in, Pack of 5 (0CON-401) is an expanded polyurethane CMP pad designed for precision polishing of hard materials. Each plain 14 in / 350 mm pad has a 0.050 in thickness, pressure-sensitive adhesive backing and a firm, controlled-cell EP1 structure for use with the Logitech LP50.

Key Features

  • 14 in / 350 mm plain pad, supplied in the exact EP1-P configuration identified as part 0CON-401
  • Pack of five polishing pads, providing multiple pads for planned replacement and production requirements
  • Compatible with the Logitech LP50, matching the manufacturer-listed system for this pad diameter
  • Firm EP1 polyurethane construction, using a foamed elastomer structure with controlled cells
  • 0.050 in pad thickness, supplied with pressure-sensitive adhesive backing for secure plate attachment
  • High-hardness polishing surface, with Shore A hardness of 96 and Shore D hardness of 46
  • Controlled mechanical response, combining 7.5% dynamic compressibility with 93% elastic rebound
  • Designed for smaller sample surfaces, with the plain configuration recommended for areas below 20 cm²
  • Suitable for hard materials, including silicon, sapphire and optical materials

Benefits

  • Helps improve planarity through the firm, high-hardness EP1 structure.
  • Supports consistent polishing contact through controlled compression and rapid elastic recovery.
  • Promotes efficient abrasive retention for high-quality surface finishes and controlled flatness.
  • Allows straightforward and stable installation through the protected PSA backing.
  • Provides the correct pad diameter and plain configuration for compatible Logitech LP50 workflows.

Why Choose the Logitech EP1 Plain Polishing Pad, 14 in, Pack of 5 (0CON-401)?

Choose the Logitech EP1 Plain Polishing Pad, 14 in, Pack of 5 (0CON-401) when a firm, PSA-backed CMP pad is required for smaller polishing surfaces and hard materials. Its controlled-cell construction combines high hardness, limited compressibility and strong elastic recovery to support precision surface preparation. John Morris Group supplies genuine Logitech polishing consumables for laboratories and materials-processing facilities across Australia.

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