The Logitech CMP Orbis with 4 Pump Modules is a floor-standing, precision-engineered Chemical Mechanical Polishing (CMP) system designed for R&D and pilot production environments. With advanced analytical functionality, customizable process parameters, and real-time monitoring, it provides a cost-effective platform to simulate production-level conditions while remaining versatile enough for traditional research use. The system supports wafer sizes up to 200 mm and includes an intuitive touchscreen interface for recipe creation and control.
Product Features
- Precision-engineered floor-standing CMP system optimized for R&D and pilot production environments
- Configured for polishing 4” and 6” wafers with upgrade capability to 8” (200 mm)
- Includes 4 independent pump modules for controlled slurry delivery and process flexibility
- Touchscreen interface allows configuration of parameters such as coefficient of friction (CoF), carrier load, and slurry delivery
- On-board analytical sensors provide real-time process monitoring and feedback through the system interface
- Recipe mode enables users to build, save, and recall multi-stage processes for repeatability and ease of use
- Supports polishing of die, wafers, and partial wafers using a dedicated carrier or direct sample mounting
- Suitable for small batch production and pilot process testing
- Low-cost CMP solution delivering high-performance, production-level capabilities in a compact format
- Compatible with Logitech templates and shims for added sample mounting flexibility
What's Included
- Ideal for R&D environments and pilot process testing
- High capacity workspace for samples up to 2 of 200 mm (8″)
- Downloadable data for analysis of process parameters
- Laboratory scale footprint
- Industry standard pad conditioning to maintain optimum pad life
Benefits
- Replicates production-level CMP conditions in a cost-effective research tool
- Reduces learning curve and operator variability with intuitive touchscreen control and recipe memory
- Delivers enhanced analytical insight with real-time monitoring for optimized process development
- Versatile for both R&D and small-scale production applications
- Maximizes sample throughput and control with four independent slurry pumps
Why Choose the Logitech CMP Orbis with 4 Pump Modules?
The Logitech CMP Orbis with 4 Pump Modules is a high-precision CMP solution for laboratories and pilot production environments seeking production-grade performance with flexible configuration. With built-in sensors, multi-stage recipe management, and real-time feedback, it ensures repeatable, high-quality polishing across a broad range of wafer sizes. Whether you're developing new processes or refining pilot runs, the Orbis is your cost-effective path to advanced CMP capability.
