Logitech Chemcloth Polishing Cloths are designed to meet the strict requirements of Chemical Mechanical Polishing (CMP). Featuring a black napped urethane surface layer intrinsic to the substrate, these polishing cloths offer superior nap strength and extended pad life. The vertically oriented pore structure with a compressible substrate ensures instant recovery from compression, enhancing slurry flow during polishing.
Product Features
- Logitech Chemcloth polishing cloths for Chemical Mechanical Polishing (CMP)
- 12" (300 mm) diameter size
- Pack of 10 polishing cloths
- Black napped urethane surface layer for superior nap strength
- Extended pad life with durable substrate design
- Vertically oriented pore structure with compressible substrate for enhanced slurry flow
- Protected self-adhesive backing for easy application
- Hermetically sealed packaging in polythene sachets to maintain integrity
Benefits
- Provides consistent and precise CMP performance
- Durable design supports longer usage life
- Improves slurry distribution for efficient polishing
- Easy application with self-adhesive backing
- Secure, contamination-free storage with hermetic sealing
Why Choose Logitech Chemcloth Polishing Cloth, 12" (300 mm) Diameter, Pack of 10?
These polishing cloths offer reliability, durability, and enhanced slurry flow for CMP processes, making them ideal for laboratories and industries requiring precision polishing solutions.
