The Logitech Chemcloth Polishing Pad, 560 mm, Pack of 10 (0CON-355) is a soft textile-based polyurethane polishing cloth manufactured for Chemical Mechanical Polishing processes. Supplied as ten plain 560 mm (22 inch) pads with self-adhesive backing, it is suitable for bulk and final polishing across semiconductor, optical and hard-material applications.
Key Features
- Large 560 mm pad diameter, equivalent to 22 inches for compatible polishing-plate applications
- Plain non-grooved configuration, allowing segmentation to suit the sample size and polishing process
- Soft textile-based polyurethane construction, suitable for polishing both soft and hard materials
- Consistent 1.5 mm pad thickness, with a typical weight density of 0.30 g/mL
- Controlled compression behaviour, with 0.25 mm dynamic deflection and 10-20% dynamic compressibility
- Black woven polishing surface, engineered to retain abrasive efficiently during processing
- Vertically oriented pore structure, with a compressible substrate that recovers after compression to support slurry flow
- Protected self-adhesive backing, supporting secure application to a clean, smooth and flat base plate
- Broad CMP material coverage, including III-V and II-VI semiconductors, silicon, sapphire, optics, silicon carbide and diamond
- Protective sealed packaging, with each pack hermetically sealed in a polythene sachet
Note: Logitech states that plain pads are typically used for samples smaller than 2 inches. For samples 2 inches or larger, the pad should be grooved to improve slurry delivery and waste-slurry removal.
Benefits
- Supports high-quality surface finishing and flatness by retaining abrasive efficiently across the polishing surface.
- Enhances slurry movement and helps reduce pad loading through the compressible, recovery-oriented pore structure.
- Provides a versatile option for bulk and final polishing of softer materials and final buff polishing of harder materials.
- Supports production and high-speed polishing workflows through strong nap performance and wear resistance.
- Facilitates polishing under acid and alkaline process conditions while the adhesive backing simplifies pad installation.
Why Choose the Logitech Chemcloth Polishing Pad, 560 mm, Pack of 10 (0CON-355)?
The Logitech Chemcloth Polishing Pad, 560 mm, Pack of 10 (0CON-355) combines controlled compressibility, efficient abrasive retention and a self-adhesive plain-pad format for demanding CMP workflows. John Morris Group supplies this Logitech polishing consumable to Australian laboratories working with semiconductor, optical and other precision materials.
