The CMP Orbis is a precision engineered, floor standing Chemical Mechanical Polishing (CMP) system
ideally suited for R&D environments where the main purpose or application is to conduct pilot production tests with optimum analytical capabilities and enhanced process performance.

Designed to be readily adaptable as an enabling technology in preproduction testing, though it also has the ability to suit a range of processing uses. Highly adaptable, it can be utilised for back-end IC manufacturing, Micro-Electromechanical Systems (MEMS) fabrication, Opto-MEMS and Bio-MEMS
fabrication. Achieve laser quality surfaces with Ra to sub-nanometer levels of material removal across a wide range of materials.

Floor standing CMP tool ideally suited to R&D environments - typically used in applcations which conduct pilot production tests.
High capacity work space for two samples up to 200mm or multiple smaller samples through the use of templates.
Produces results typically seen on production scale equipment whilst keeping a lab scale footprint.
Utilises an array of sophisticated software based analytical and data collection modules
Motor driven carrier heads along with plate speeds of up to 160rpm facilitate faster polishing rates with greater levels of control.
Allows for a bespoke approach in machine set-up and operation by allowing the operator to configure a wide range of parameters and process conditions.
Twin peristaltic pumps control slurry capacity and delivers equal volumes of slurry through two separate nozzles. Different slurries can be used in each pump for different processing needs if required.
Comes with an industry standard CMP diamond pad conditioner which fits on the second motor driven carrier, allowing pad conditioning to be carried out effortlessly during sample processing. This allows for greater wafer yields, increased process repeatability and a lower cost of ownership.
On-board analytical sensors allow the operator concise real-time monitoring capabilities via the systems interface. Operators can also save and export data via the USB port.
Recipe mode allows users to build, save and re-call multi-stage recipes allowing for easy process repeatability.
Chemically resistant to standard chemicals used in CMP applications, including sodium hypochlorite.

Floor standing CMP tool ideally suited to R&D environments - typically used in applcations which conduct pilot production tests.
High capacity work space for two samples up to 200mm or multiple smaller samples through the use of templates.
Produces results typically seen on production scale equipment whilst keeping a lab scale footprint.
Utilises an array of sophisticated software based analytical and data collection modules
Motor driven carrier heads along with plate speeds of up to 160rpm facilitate faster polishing rates with greater levels of control.
Allows for a bespoke approach in machine set-up and operation by allowing the operator to configure a wide range of parameters and process conditions.
Twin peristaltic pumps control slurry capacity and delivers equal volumes of slurry through two separate nozzles. Different slurries can be used in each pump for different processing needs if required.
Comes with an industry standard CMP diamond pad conditioner which fits on the second motor driven carrier, allowing pad conditioning to be carried out effortlessly during sample processing. This allows for greater wafer yields, increased process repeatability and a lower cost of ownership.
On-board analytical sensors allow the operator concise real-time monitoring capabilities via the systems interface. Operators can also save and export data via the USB port.
Recipe mode allows users to build, save and re-call multi-stage recipes allowing for easy process repeatability.
Chemically resistant to standard chemicals used in CMP applications, including sodium hypochlorite.

CMP Orbis with 4 pump modules and vacuum carriers

Over 40,000 Customers Trust John Morris